Vukkadala, Pradeep: search on Z-Library

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1

Models to relate wafer geometry measurements to in-plane distortion of wafers

Turner, Kevin T., Vukkadala, Pradeep, Sinha, Jaydeep K.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 2.82 MB

english, 2016

2

Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress

Brunner, Timothy A., Menon, Vinayan C., Wong, Cheuk Wun, Gluschenkov, Oleg, Belyansky, Michael P., Felix, Nelson M., Ausschnitt, Christopher P., Vukkadala, Pradeep, Veeraraghavan, Sathish, Sinha, Jayd

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 11.72 MB

english, 2013

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Patterned wafer geometry grouping for improved overlay control

Sanchez, Martha I., Ukraintsev, Vladimir A., Lee, Honggoo, Han, Sangjun, Woo, Jaeson, Park, Junbeom, Song, Changrock, Anis, Fatima, Vukkadala, Pradeep, Jeon, Sanghuck, Choi, DongSub, Huang, Kevin, Heo

Year:

2017

Language:

english

File:

PDF, 629 KB

english, 2017

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Characterization of electrostatic chucks for extreme ultraviolet lithography

Mulholland, Tom C., Schellenberg, Frank M., La Fontaine, Bruno M., Zeuske, Jacob R., Vukkadala, Pradeep, Engelstad, Roxann L.

Year:

2009

Language:

english

File:

PDF, 1.53 MB

english, 2009

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Improvement of process control using wafer geometry for enhanced manufacturability of advanced semiconductor devices

Cain, Jason P., Sanchez, Martha I., Lee, Honggoo, Lee, Jongsu, Kim, Sang Min, Lee, Changhwan, Han, Sangjun, Kim, Myoungsoo, Kwon, Wontaik, Park, Sung-Ki, Vukkadala, Pradeep, Awasthi, Amartya, Kim, J.

Year:

2015

Language:

english

File:

PDF, 910 KB

english, 2015

6

Determining local residual stresses from high resolution wafer geometry measurements

Gong, Jie, Vukkadala, Pradeep, Sinha, Jaydeep K., Turner, Kevin T.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2013

Language:

english

File:

PDF, 4.20 MB

english, 2013

7

[IEEE 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2015.5.3-2015.5.6)] 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Monitoring process-induced focus errors using high-resolution flatness metrology

Morgenfeld, Bradley J., Brunner, Timothy A., Nummy, Karen, Stoll, Derek, Jing, Nan, Lin, Hong, Vukkadala, Pradeep, Herrera, Pedro, Ramkhalawon, Roshita, Sinha, Jaydeep

Year:

2015

Language:

english

File:

PDF, 1.34 MB

english, 2015

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - A study of reticle non-flatness induced image placement error contributions in EUV lithography

La Fontaine, Bruno M., Raghunathan, Sudhar, Wood, Obert, Vukkadala, Pradeep, Engelstad, Roxann, Lee, Brian, Bouten, Sander, Laursen, Thomas, Zimmerman, John, Sohn, Jaewoong, Hartley, John

Year:

2010

Language:

english

File:

PDF, 2.13 MB

english, 2010

9

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Measuring and characterizing the nonflatness of EUVL reticles and electrostatic chucks

Engelstad, Roxann L., Naber, Robert J., Kawahira, Hiroichi, Turner, Kevin T., Nataraju, Madhura, Sohn, Jaewoong, Mikkelson, Andrew R., Battula, Venkata Siva, Vukkadala, Pradeep, Zeuske, Jacob R., Van

Year:

2007

Language:

english

File:

PDF, 630 KB

english, 2007

10

SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - Mounting methodologies to measure EUV reticle nonflatness

Battula, Venkata Siva, Behringer, Uwe F. W., Zeuske, Jacob R., Engelstad, Roxann L., Vukkadala, Pradeep, Mikkelson, Andrew R., Van Peski, Chris K.

Year:

2009

Language:

english

File:

PDF, 1.87 MB

english, 2009

11

Impact of Wafer Geometry on CMP for Advanced Nodes

Vukkadala, Pradeep, Turner, Kevin T., Sinha, Jaydeep K.

Journal:

Journal of The Electrochemical Society

Year:

2011

Language:

english

File:

PDF, 7.07 MB

english, 2011

12

Determination of local electrostatic forces for EUVL mask chucks

Gerhard Kalkowski, Thomas Peschel, Stefan Risse, Sandra Müller, Roxann L. Engelstad, Jacob R. Zeuske, Pradeep Vukkadala

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 1.11 MB

english, 2010

13

SPIE Proceedings [SPIE 26th European Mask and Lithography Conference - Grenoble, France (Monday 18 January 2010)] 26th European Mask and Lithography Conference - Overview of IP error compensation techniques for EUVL

Vukkadala, Pradeep, Behringer, Uwe F.W., Maurer, Wilhelm, Patil, Deepak, Engelstad, Roxann L.

Year:

2010

Language:

english

File:

PDF, 2.25 MB

english, 2010

14

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Status of EUVL reticle chucking

Engelstad, Roxann L., Sohn, Jaewoong, Zeuske, Jacob R., Battula, Venkata Siva, Vukkadala, Pradeep, Van Peski, Chris K., Orvek, Kevin J., Turner, Kevin T., Mikkelson, Andrew R., Nataraju, Madhura

Year:

2008

Language:

english

File:

PDF, 788 KB

english, 2008

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